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LED epitaxial material-MO source

LED epitaxial material-MO source

  • Categories:Application
  • Time of issue:2020-05-27 00:00:00
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LED epitaxial material-MO source
High-purity metal-organic source-MO source is a key supporting raw material for generating compound semiconductor materials using advanced metal-organic chemical vapor deposition (MOCVD) or plasma enhanced chemical vapor deposition (PECVD) or atomic layer deposition (ALD) processes, Therefore, it is called the "precursor" of MOCVD, which generates high-quality thin film materials with special gases (nitrogen source gas, oxygen source gas, arsine & phosphorane, etc.) under high temperature conditions, and is mainly used to produce high-brightness luminescence Tube (LED), high mobility transistors, semiconductor lasers, solar cells and other devices, and one of the core raw materials for infrared detection, ultra-high-speed computers, phase change memory, radio frequency integrated circuit chips, etc.

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Address: No. 2266, Hero Avenue, Economic and Technological Development Zone, Nanchang City, Jiangxi Province
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0791-83960365
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Cell phone:
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